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KMID : 1102020190490010006
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Applied Microscopy
2019 Volume.49 No. 1 p.6 ~ p.6
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Evaluation of ion/electron beam induced deposition for electrical connection using a modern focused ion beam system
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An Byeong-Seon
Kwon Ye-Na
Oh Jin-Su
Shin Yeon-Ju
Ju Jae-Seon
Yang Cheol-Woong
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Abstract
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Focused ion beam method, which has excellent capabilities such as local deposition and selective etching, is widely used for micro-electromechanical system (MEMS)-based in situ transmission electron microscopy (TEM) sample fabrication. Among the MEMS chips in which one can apply various external stimuli, the electrical MEMS chips require connection between the TEM sample and the electrodes in MEMS chip, and a connected deposition material with low electrical resistance is required to apply the electrical signal. Therefore, in this study, we introduce an optimized condition by comparing the electrical resistance for C-, Pt-, and W- ion beam induced deposition (IBID) at 30?kV and electron beam induced deposition (EBID) at 1 and 5?kV. The W-IBID at 30?kV with the lowest electrical resistance of about 30?Ω shows better electrical properties than C- and Pt-IBID electrodes. The W-EBID at 1?kV has lower electrical resistance than that at 5?kV; thus, confirming its potential as an electrode. Therefore, for the materials that are susceptible to ion beam damage, it is recommended to fabricate electrical connections using W-EBID at 1?kV.
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KEYWORD
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Focused ion beam, Electron beam induced deposition, Ion beam induced deposition, Electrical resistance
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